Tin Oxide- Sputtering Target Purity:>=99.96% KTaO3 single Crystal substrates and
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Tin Oxide- Sputtering Target Purity:>=99.96% KTaO3 single Crystal substrates andHigh purity, low cost standard round Tin Oxide Sputter Targets * ~90% density * Low gas content * Dense and homogeneous * Small, uniform grains <100um Contact Us : Request for Custom Sizes & Target Bonding services
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